报告题目：Multicolor Photolithography: Breathing New Life into Moore's Law
报告人：Prof. John Fourkas
Department of Chemistry & Biochemistry, Institute for Physical Science and Technology
University of Maryland, College Park
For the first time in the history of the semiconductor industry, we have deviated from the path of Moore’s Law. Getting back on track will require addressing many challenges in materials science. One of the reasons for the delayed progress in resolution improvement is that moving to exposing photoresists in the extreme ultraviolet has proven a daunting task. An alternative approach is to take a cue from optical microscopy, in which resolution enhancement has been achieved by developing techniques that rely on exposure to multiple colors of light. Multicolor lithography is a promising approach for the patterning of negative-tone photoresists with resolution in the tens of nm range using light in the visible or near ultraviolet. This approach is progressing from its original, 2-color schemes to more advanced 3-color schemes that offer substantially better resolution and a greater degree of flexibility in the patterning process.
The development of industrially relevant multicolor photoresists will require versatile and highly controllable photochemical approaches. I will discuss our recent progress in this field and new tools that we have developed for the rapid analysis of candidate materials.
John T. Fourkas is the Millard Alexander Professor of Chemistry at the University of Maryland, College Park. He received his BS and MS in Chemistry from Caltech in 1986, and his PhD in Chemistry from Stanford University in 1991. After performing postdoctoral research at the University of Texas, Austin and the Massachusetts Institute of Technology, he joined the faculty of the Department of Chemistry and Biochemistry at Boston College in 1994, and moved to the University of Maryland in 2005. His research interests involve applications of ultrafast, nonlinear optical phenomena in areas such as spectroscopy, imaging, and nanofabrication. He is a Senior Editor for the Journal of Physical Chemistry. He is a Fellow of the OSA, the American Physical Society, and the American Association for the Advancement of Science.
John Fourkas教授现为美国马里兰大学化学系的Millard Alexander Professor。他于1986年毕业于加州理工学院，获得化学学士和硕士学位，1991年毕业于斯坦福大学，获得化学专业哲学博士学位。1991-1994年他先后在德州大学奥斯汀分校和麻省理工学院从事博士后研究。1994年，他加入波士顿学院化学系，成为助理教授。2005年，他加入马里兰大学化学系。他的研究领域主要涉及超快非线性光谱的基础研究和应用，包括谱学性质、成像和纳米加工。他现在是美国化学会旗下期刊Journal of Physical Chemistry的高级编辑，同时也是美国物理学会、美国光学学会和美国科学促进会的会士。